EQ-PDC-001 is middle-size plasma cleaner with 6"dia x 6.5"L quartz chamber.
It is designed to clean and remove nano-scale organic contamination on substrate or wafer up to 4" using air, oxygen, or argon plasma. The rate of organic removal is about 20 nm/min Max. at high RF power.
It is excellent tool to pre-clean single crystal substrate before epitaxial film deposition to achieve the better quality.
If you don't have experience for plasma surface cleaning, please refer to the articles as the follows:
•McIntire, Theresa M., S. Rachelle Smalley, John T. Newberg, A. Scott Lea, John C. Hemminger, Barbara J. Finlayson-Pitts. "Substrate Changes Associated with the Chemistry of Self-Assembled Monolayers on Silicon." Langmuir (2006) 22(13): 5617-5624.
•Sumner, Ann Louise, Erik J. Menke, Yael Dubowski, John T. Newberg, Reginald M. Penner, John C. Hemminger, Lisa M. Wingen, Theo Brauers, Barbara J. Finlayson-Pitts. "The Nature of Water on Surfaces of Laboratory Systems and Implications for Heterogeneous Chemistry in the Troposphere." Phys. Chem. Chem. Phys. (2004) 6: 604-613.
•Mennicke, Ulrike, Tim Salditt. "Preparation of Solid-Supported Lipid Bilayers by Spin-Coating." Langmuir (2002) 18: 8172-8177.
SPECIFICATIONS
Input Power
AC 110V/220V , 50/60 Hz, < 200 W
RF Power
RF power (High voltage & high frequency current applied on the coil) is adjustable at three levels :
Low Setting
716 V
10 mA
7.2 W
Medium Setting
720 V
15 mA
10.5 W
High Setting
740 V
40 mA
30 W
Plasma Chamber
•6" diameter x 6.5" length quartz chamber •Hinged type door with viewing window for easy sample loading and observing
Vacuum Gauge & Display
•A vacuum sensor is installed on the hinged door,w ch allow processing is repeatable without guessing •digital display unit is included for measuruing vacuum in Pa,torr and mbar units. •1/8" NPT needle valve to qualitatively control gas flow and chamber pressure. •1/8" NPT 3-way valve to quickly switch from bleeding in gas, isolating the chamber, and venting.
•Many inert gases can be choosen for plasma cleaning, such as N2, Ar, Air and Mixed gas depended on what kind material will be treated . ( not included in the package) •No flammable gas shall be used for the plasma cleaner
Optional
•Combinations of PDC-36G plasma cleaner with Two Channel Gas Mixer will be a solution for introducing upto two process gases.
Order plasma cleaner with two channel gas mixer from product options or Click the picture left for Two Channel Gas Mixer. •If use 4" wafer quartz boat, the cleaner can traet 25 pcs 2"dia wafer per load
Overall Dimensions
•380(H) x 460(W) x 350(D) mm (Without Gas Mixer) •570(H) x 460(W) x 350(D) mm (With Gas Mixer)
Net Weight
•45 Lbs without pump •65 Lbs with vacuum pump
Warranty
One year limited warranty with lifetime support ( no warranty for Pyrex glass chamber )