Plasma Cleaners

 
 
 
Expanded Plasma Cleaner with Digital Vacuum Gauge, 6"Dx 6.5"L Quartz Chamber, 13.56 Mhz, 30W max. - EQ-PDC-001-LDEQ-PDC-001-LD-220EQ-PDC-001-LD-2F-220EQ-PDC-001-LD-110EQ-PDC-001-LD-2F-110

Expanded Plasma Cleaner with Digital Vacuum Gauge, 6"Dx 6.5"L Quartz Chamber, 13.56 Mhz, 30W max. - EQ-PDC-001-LD
EQ-PDC-001-LD-220
EQ-PDC-001-LD-2F-220
EQ-PDC-001-LD-110
EQ-PDC-001-LD-2F-110

기본 정보
Product Name Expanded Plasma Cleaner with Digital Vacuum Gauge, 6"Dx 6.5"L Quartz Chamber, 13.56 Mhz, 30W max. - EQ-PDC-001-LD
EQ-PDC-001-LD-220
EQ-PDC-001-LD-2F-220
EQ-PDC-001-LD-110
EQ-PDC-001-LD-2F-110
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상품 옵션
 
  •  Product Options
Select Model Item Number
Standard Version without Gas Mixer
(AC 220V )
EQ-PDC-001-LD-220
Updated Version w/ Gas Mixer
(AC 220V )
EQ-PDC-001-LD-2F-220
Standard Version without Gas Mixer
(AC 110V )
EQ-PDC-001-LD-110
Updated Version w/ Gas Mixer
(AC 110V )
EQ-PDC-001-LD-2F-110
  • EQ-PDC-001 is middle-size plasma cleaner with 6"dia x 6.5"L quartz chamber.    It is designed to clean and remove nano-scale organic contamination on substrate or wafer up to 4" using air, oxygen, or argon plasma. The rate of organic removal is about 20 nm/min Max. at high RF power.    It is excellent tool to pre-clean single crystal substrate before epitaxial film deposition to achieve the better quality.    If you don't have experience for plasma surface cleaning, please refer to the articles as the follows:
  • McIntire, Theresa M., S. Rachelle Smalley, John T. Newberg, A. Scott Lea, John C. Hemminger, Barbara J. Finlayson-Pitts. "Substrate Changes Associated with the Chemistry of Self-Assembled Monolayers on Silicon." Langmuir (2006) 22(13): 5617-5624.
  • Sumner, Ann Louise, Erik J. Menke, Yael Dubowski, John T. Newberg, Reginald M. Penner, John C. Hemminger, Lisa M. Wingen, Theo Brauers, Barbara J. Finlayson-Pitts. "The Nature of Water on Surfaces of Laboratory Systems and Implications for Heterogeneous Chemistry in the Troposphere." Phys. Chem. Chem. Phys. (2004) 6: 604-613.
  • Mennicke, Ulrike, Tim Salditt. "Preparation of Solid-Supported Lipid Bilayers by Spin-Coating." Langmuir (2002) 18: 8172-8177.
  •  SPECIFICATIONS
  • Input Power
  • AC 110V/220V ,    50/60 Hz,    < 200 W
  • RF Power
  • RF power (High voltage & high frequency current applied on the coil) is adjustable at three levels :
    Low Setting 716 V 10 mA 7.2 W
    Medium Setting 720 V 15 mA 10.5 W
    High Setting 740 V 40 mA 30 W
  • Plasma Chamber
  • 6" diameter x 6.5" length quartz chamber
    Hinged type door with viewing window for easy sample loading and observing
  • Vacuum Gauge & Display
  • A vacuum sensor is installed on the hinged door,w ch allow processing is repeatable without guessing
    digital display unit is included for measuruing vacuum in Pa,torr and mbar units.
    1/8" NPT needle valve to qualitatively control gas flow and chamber pressure.
    1/8" NPT 3-way valve to quickly switch from bleeding in gas, isolating the chamber, and venting.
  • Inert Gas
  • Many inert gases can be choosen for plasma cleaning, such as N2, Ar, Air and Mixed gas depended on what kind material will be treated . ( not included in the package)
    No flammable gas shall be used for the plasma cleaner
  • Optional

  • Combinations of PDC-36G plasma cleaner with Two Channel Gas Mixer  will be a solution for introducing upto two process gases.    Order plasma cleaner with two channel gas mixer from product options or Click the picture left for Two Channel Gas Mixer.
    If use 4" wafer quartz boat , the cleaner can traet 25 pcs 2"dia wafer per load
  • Overall Dimensions

  • 380(H) x 460(W) x 350(D) mm (Without Gas Mixer)
    570(H) x 460(W) x 350(D) mm (With Gas Mixer)
  • Net Weight
  • 45 Lbs without pump
    65 Lbs with vacuum pump
  • Warranty
  • One year limited warranty with lifetime support
    ( no warranty for Pyrex glass chamber )
  • Operation Manual