Plasma/ UO Cleaners

Atomospheric Plasma Beam With Automatic Scanning System For Surface Treatment-GSL1100X-PJF-A

Atomospheric Plasma Beam With Automatic Scanning System For Surface Treatment-GSL1100X-PJF-A

기본 정보
Product Name Atomospheric Plasma Beam With Automatic Scanning System For Surface Treatment-GSL1100X-PJF-A
Sale Price Call for Price
Product Code GSL1100X-PJF-A
Quantity 수량증가수량감소
상품 옵션
 
  • GSL1100X-PJF-A combines atmospheric plasma beam together with two dimensions automatic working stage, which allows plasma beam to scan sample surface according to program setting and surface coating or treatment consistent and uniform.   The system consists of RF generator, flexible gas delivery pipe, plasma beam head, X-Y working stage with vacuum chuck sample holder and programmable control box.   The plasma beam can activate and clean material surface rapidly at low temperature without vacuum, such as single crystal wafer, optical component, plastics etc, and also it can make plasma enhanced CVD film on substrate via mixture chemical gas under Atomospheric pressure.
  •  SPECIFICATIONS
  • Input Power for Plasma
  • 208 V - 240 VAC,    50/60 Hz,    < 1000 W
  • RF Generator
  • Output Frequency : 20 - 23 kHz ,    25 KV
     ( click picture below - left to see detail specs )
     
    Plasma Beam Head :

    ○  Two plasma Beam heads are included :

    ○  Round head : 10-12 mm ;
    ○  Rectangular head : 15-18 mm

     
  • Input Gas Pressure and Working Gases
  • 40 PSI min. (0.055 Mpa)
    Air, N2, Ar, He or any mixed gas ( no flammable and explosive gases )
  • Plasma Working Pressure
  • 7 - 10 PSI
  • Working Environmental
  • Temperature : < 42 °C
    Humidity : ≤ 40 ℃RH
    No flammable gas
  • Saple Stage & Controller
  • X-Y two dimension are driven by step motors and controlled by SBC control box.
    Z axis is adjustable by manual
    Control box has LCD display and scanning program can be set by function key
    Max. scanning area : 8" x 9"
    One 4" diameter vacuum chunk is installed on X-Y sample holder, which can soak thin wafer up to 6" diameter on the sample holder firmly
    One vacuum pump is included to connect the vacuum chunk
    Whole system is placed on a heavy duty mobile cart (600 x 600 x 800 L mm)
    Optional : Heating plate upto 500 °C can be installed on the movement stage with manufacture modification (available upon request at extra cost). also, it can be placed inside glovebox to operate under iner gas atmosphere or inside a fume hood for harmful gases (see pictures below-right)
     
     
  • Dimensions & Net Weight
  • Coating Stage Dimensions : 560 mm L x 483 mm W x x 609 mm H
     (Supporting Frame Dimensions : 420 mm L x 305 mm W x 457 mm H)
    Plasma Generator Dimensions : 406 mm L x 508 mm W x 230 mm H
    Movement Control Box Dimensions : 330 mm L x 305 mm W x 152 mm H
    Net weight : 55 kg
  • Warranty & Certificate
  • One year limited warranty with lifetime support
    CE certified
  • Operation Instructions