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8" POROMERIC POLISHING PAD (PSA)
Poromeric pad is made of napped none-woven materials with uniform pore structure and wall strength. It is excellent for the applications, such as
- Final polishing of LiNbO3 and Sapphire wafers
- Final polishing in CMP for semiconductors and oxide crystals.
- EPI polishing for all single crystal substrates.
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