GSL1100X-PJF is a compact Atmospheric Plasma Jet-Flow ( so called Plasma Beam , Plasma Pen) system for surface Treatment, which consist of RF generator, flexible gas delivery pipe and plasma beam head.
The plasma jet flow can activate and clean material surface rapidly at low temperature without vacuum, such as single crystal wafer, optical component, plastics etc.
It is excellent for treat wafer surface before epitaxial or optical coating to obtain higher quality thin film.
This device also may be used for studying Atomospheric pressure CVD.
SPECIFICATIONS
Input Power
110 V - 240 VAC, 50/60 Hz, < 1000 W
Output Frequency
20 - 23 kHz
Plasma Beam head
•Two plasma Beam heads are included
1. round head ： 10-12 mm 2. retangular head ： 15-18 mm
Features
•High speed surface treatment with simple and safe operation •Neither vaccum nor chamber required with versatile plasma chemistry •Handheld or in-line processing at low cost •light weight and compact size
Input Gas Pressure and Working Gases
•40 PSI min. •Air, N2, Ar, He or any mixed gas ( no flammable and explosive gases)
Plasma working Pressure
7 - 10 PSI
Working Environment
•Temperature : < 42 °C •Himunity : ≤ 40 ℃RH •No flammable gas
Overall Dimensions
380 (W) ×210 (H) ×500 (D) mm
Net Weight
10 kg
Warranty & Certificate
•One year limited with lifetime support •CE certified
Operation Manual
Application Notes
•This Atomospheric Plasma Jet-Flow system is excellent to clean platic ,polymer and oxide substrate surface before coating •This device also may be used for studying Atomospheric pressure CVD. •You may click picture below to order our automatic scan system to achieve clean or coating for 10" x 10" area
