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Compact Plasma Cleaner with Vacuum Pump , 3"Dx 6.5"L Quartz Chamber, 13.56 Mhz - EQ-PDC-32G-LD

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Product Name Compact Plasma Cleaner with Vacuum Pump , 3"Dx 6.5"L Quartz Chamber, 13.56 Mhz - EQ-PDC-32G-LD
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Product Code EQ-PDC-32G-LD
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  • EQ-PDC-32G is a compact and low cost plasma cleaning system which is designed to clean and remove nanoscale organic contamination on wafer upto 2" with air, oxygen, or argon plasma.    The rate of organic removal is about 10 nm/min Max. at high RF power.    It is an excellent tool to pre-clean single crystal substrate before expitaxial film deposition to the acheive a better quality.    If you don't have any experience for plasma surface cleaning, please refer to the articles as the follows :
  • McIntire, Theresa M., S. Rachelle Smalley, John T. Newberg, A. Scott Lea, John C. Hemminger, Barbara J. Finlayson-Pitts.    "Substrate Changes Associated with the Chemistry of Self-Assembled Monolayers on Silicon."    Langmuir (2006) 22(13): 5617-5624.
    Sumner, Ann Louise, Erik J. Menke, Yael Dubowski, John T. Newberg, Reginald M. Penner, John C. Hemminger, Lisa M. Wingen, Theo Brauers, Barbara J. Finlayson-Pitts.    "The Nature of Water on Surfaces of Laboratory Systems and Implications for Heterogeneous Chemistry in the Troposphere."    Phys. Chem. Chem. Phys. (2004) 6: 604-613.
    Mennicke, Ulrike, Tim Salditt.    "Preparation of Solid-Supported Lipid Bilayers by Spin-Coating."    Langmuir (2002) 18: 8172-8177.
  • RF Power
  • RF power (High voltage & high frequency current applied on the coil) is adjustable at three levels :
    Low Setting 680 V 10 mA 6.8 W
    Medium Setting 700 V 15 mA 10.5 W
    High Setting 720 V 25 mA 18 W
  • Features
  • Compact, tabletop unit
    Adjustable RF power
    Low, Medium, and High power settings
    High purity 3" quartz chamber
    Safe operation at low cost and environmental freindly
  • Plasma Chamber
  • 3" diameter x 6.5" length high purity quartz chamber is included.
    A removable front cover assembly is included.
    Vacuum gauge is not included. A 1/8NPT female connector in flange is used to install the gauge.
  • Vacuum Pump and Valve
  • 1/8" NPT needle valve to qualitatively control gas flow and chamber pressure.
    1/8" NPT 3-way valve to quickly switch from bleeding in gas, isolating the chamber, and venting.
    A signle stage vacuum pump  with exhast filter  is included.
  • Overall dimension
  • 8.5" H x 10" W x 8" D
  • Net Weight
  • 17 Lbs without pump
    32 Lbs with vacuum pump
  • Warranty
  • One year limited warranty with lifetime support ( no warranty for Pyrex glass chamber )
  • Operation Instructions
  • Application Notes
  • Many inert gases can be choosen for plasma cleaning, such as N2, Ar, Air and Mixed gas depended on what kind material will be treated.    ( not included in the package ).    No flammable gas shall be used for the plasma cleaner.
    The best vacuum range for plasma cleaning process in this model is around 200 mtorr - 1000 mtorr.
  • Standard packing list
  • Plasma cleaner
    Pyrex glass chamber
    Vacuum flange assembly with gas inet valve
    500W transformer
    Power cord
    a  Single Step Rotary Vane Vacuum Pump with advanced exhuast filter
  • Optional Accessories
  • Combinations of PDC-32G plasma cleaner with Two Channel Gas Mixer and Digital Vacuum Gauge will be a complete system solution for introducing upto two (2) process gases and monitoring chamber pressure.    Please click picture below to order :