OTF-1200X-50-PE-S is a affordable and compact PE-CVD (Plasma Enhanced Chemical Vapor Deposition) tube furnace system. This system consists of: a 500W RF plasma generator, a 2" O.D split tube furnace with vacuum flange and fittings. and a double stage rotary vane pump with a movable working table. This system can be updated to advanced model with optionals. It is ideal tool for the researcher to make innovation under limited budget
○ Lower temperature processing compared to conventional CVD.
○ Film stress can be controlled by high/low frequency mixing techniques.
○ Control over stoichiometry via process conditions.
○ Can do a wide range of material deposition, including SiOx, SiNx, SiOxNy and Amorphous silicon
○ (a-Si:H) deposition.