The GZK-PID-101 is a sensitive, compact and PID-controlled vacuum pressure regulating system. The system consists of a mechanical pump which can control the output of gas flow by the mechanical pump and the PID system to keep the pressure at a constant level. This system comes with a pressure measuring transducer for precise pressure monitoring. The system is compatible with MTI furnaces to achieve ideal pressure conditions for PVD, CVD, PECVD and HPCVD processes. This system has been widely used for applications such as diffusion, oxidization, expitaxy, CVD, plasma sputtering, coating and optical fiber melting.