Plasma Sputtering Coaters & Plasma...

2" RF Plasma Magnetron Sputtering Coater for Non-Conductive Thin Films - VTC-2RF

2" RF Plasma Magnetron Sputtering Coater for Non-Conductive Thin Films - VTC-2RF

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Product Name 2" RF Plasma Magnetron Sputtering Coater for Non-Conductive Thin Films - VTC-2RF
Sale Price Call for Price
Product Code VTC2RF
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VTC-2RF is a compact 2" single head RF Plasma magnetron sputtering system coating non-metallic, mainly oxide thin film. It integrates all components into one-floor stand cabinet, including RF power source, quartz vacuum chamber, vacuum pump, recirculation water chiller and film thickness monitor etc. It is an excellent and cost-effective coater for coating thin film of non-conductive or oxide material in R&D.


Input Power

  •      • 
    220 VAC, 50/60Hz, single phase
  •      •  800 W  (including pump)
  •      •  If the voltage is 110 VAC, a 1000 W transformer is required, please click the left picture to order

Source Power

  •      •  One 13.5 MHz, 300 W RF Generator with automatic matching function is built in cabinet and
            connected to 2" sputtering head
    (click picture left to see detailed specs)
  •      •  Optional: DC sputtering power source is available for coating metallic material
  •         RF power source               DC Power source optional

Magnetron Sputtering Head

  •      •  One 2" Magnetron Sputtering Heads with water cooling jackets are included and inserted into
             quartz chamber via a quick clamp (Click
     Pic. left 1 to see detailed specs)
  •      •  One shutter is built on the flange (manually operated)
  •      •  One 16 L/min digitally controlled recirculation water chiller is required  for cooling magnetron
            sputtering heads (Click Pic. right 3 to
    order if you don't have one)
  •      •  1" sputtering head is replaceable and optional at extra cost (Click Pic. right 2 to order)
  •      •  148 cm RF cable is replaceable with extra cost (Click Pic. right 1 to order)


Sputtering Target

Vacuum Chamber

  •      •  Vacuum Chamber: 160 mm OD x 150 mm ID x  250 mm Height. made of high purity quartz
  •      •  Sealing Flange: 165 mm Dia. made of Aluminum with high-temperature silicone O-ring
  •      •  Stainless steel mesh cover is included for 100% shielding RF radiation from the chamber
  •      •  Vacuum level: 1.0E-2 Torr with included dual stage mechanical pump and 1.0E-5 Torr with
            optional turbopump

Sample Holder

  •      •  The sample holder is rotatable and heat-able made of a ceramic heater with stainless steel
  •      •  The sample holder size: 50 mm Dia. for 2" wafer max
  •      •  Rotation speed is adjustable: 1 - 10 rpm for uniform coating
  •      •  The holder temperature is adjustable from RT to 500°C Max with accuracy +/- 1.0 °C via digital
             temperature controller.
  •      •  800- 1000ºC heating sample holder is available upon request upon request.
  •      •  Optional vibration sample hold is available for power PVD coating. ( Pic 3 below )


Vacuum Pump Station

  •      •  KF25 Vacuum port is built in for connecting to a vacuum pump.
  •      •  A vacuum pump with KF25 adaptor is required, but not included.. Please click picture to order
  •      •  Vacuum level: 1.0E-2 Torr with dual stage mechanical pump and  1.0E-5 Torr with the


  • Precision quartz thickness sensor is optional,  (click Pic1  below to order ),  which can be built into the chamber to monitor coating thickness with the accuracy of 0.10 Å.  The laptop is required for display thickness corve


Overall Dimensions

   (Click the picture to see details)

Net Weight

  •      •  70 kg

Warranty & Compliance

  •      • 
    One year limited warranty with lifetime support
  •      •  CE certified
  •      •  NRTL certification is NOT available temporarily.

Operation Instruction


Application Notes

  •      •  This compact 2" RF magnetron sputtering coater is designed for coating oxide thin films on
             oxide single crystal substrates, which usually does not need high vacuum set-up
  •      •  Please use > 5N purity Ar gas for plasma sputtering
  •      •  For the best film-substrate adhesion strength, please clean the substrate surface before coating:
    •          º  Ultrasonic cleaning (Click Pic #1 to order) with the following sequential baths - (1)
                  acetone, (2) isopropyl alcohol - to remove oil and grease. Blow dry the substrate with
                  N2, then hot bake in vacuum to remove absorbed moisture
    •          º  Plasma cleaning (Click Pic #2 to order) may be needed for surface roughening,
                  surface chemical bonds activation, or additional contamination removal
    •          º  A thin buffer layer (~5 nm), such as Cr, Ti, Mo, Ta, could be applied to improve
                  adhesion of metals and alloys
  •      •  For the best performance, the non-conductive targets must be installed with a copper backing
            plate. Please refer to the instruction video below (#3) for target bonding
  •      •  MTI uses the Coaters have successfully coated ZnO on Al2O3 substrate at 500 °C (XRD profile
            in Pic #5)
  •      •  DO NOT use tap water in water chiller. Use DI water, distilled water, or anti-corrosive additives
            as colant.

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