| Input Power | |
Feature
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• To remove a variety of contaminants from surfaces of substrates samples- • Use the dry process to clean surfaces with the highly effective method
- • Generate energy at wave line between 254nm to 185nm
- • There are Oxygen inlet port, Ozone removal pump
- • LCD display unit with the substrate temperature display.
- • Buzzer for indicating completion of cleaning
- • Locking feature for locking sample feeding tray to avoid opening during operation
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UV Lamp
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• UV lamp power: 120W Max.- • Wave length: 254 nm and 185 nm
- • Max substrate size: 150 x 150 mm ( 6"x 6")
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Chamber & Sample Stage
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• Tray size: 176mm x 168mm- • Sample feeding: slide-based
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LCD Display |
• Time Duration: 1 - 99 sec / min / hr- • Sample Temperature measurement feature
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Exhausting Fan
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• An exhausting duct with fan is installed on the back of the O-Zone cleaner.- • Easy to connect with an air pipe for exhausting the O-zone gas generated by the cleaner to
the outside of the building.
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Compliance |
• CE certified- • NRTL or CSA certification is available upon request at the extra cost
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| Warranty | One-year limited warranty with lifetime support ( no warranty for Pyrex glass chamber ) |
Application |
• Cleaning molecular contamination from SPTs, AFM tips, and surfaces- • Curing UV-adhesives
- • UV-photopatterning of SAM surfaces
- • Oxidizing PDMS
- • Surface sterilization
- • Etch, pattern, sharpen
- • Clean MEMS devices
- • Clean substrate surfaces such as Si, Ge, GaAs, and all oxide crystal substrate
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| Consumable Parts | |
Operation Instructions |
 
Operational Video
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