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12" POROMERIC POLISHING PAD ( PSA)
Poromeric pad is made of napped none-woven materials with uniform pore structure and wall strength. It is excellent for applications such as,
- Final polishing of LiNbO3 and Sapphire wafers.
- Final polishing in CMP for semiconductors and oxide crystals.
- EPI polishing for all single crystal substrates.
- Final polishing for metallographic sample.
- PSA backing, fit with any 12" polishing machine
