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Three 3" POROMERIC POLISHING PAD (PSB)
Poromeric pad is made of napped none-woven materials with uniform pore structure and wall strength. It is excellent for the applications such as
- Final polishing of LiNbO3 and Sapphire samples.
- Final polishing in CMP for semiconductors and oxide crystals.
- EPI polishing for all single crystal substrates.
The 3" pad is designed for final polishing at Unipol 300 mini polisher. | 
