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Silicon Nitride film on Silicon Wafer
300 nmSilicon Nitride Film (LPCVD) on Si(100)N-type ,P-doped 100 mm dia .x0.525mm thick, 1sp,R:1-20 ohm.cm (부가세 별도)
Silicon Nitride Film
- • Si3N4 Film coated by low stress LPCVD method
- • Si3N4 Thickness: 300 nm +/- 10%
- • Si3N4 covers both side of Silicon wafer
- • Refractive Index of Si3N4: 1.95 - 2.05
Silicon Wafer Specifications:
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