Vacuum Chamber & Sputtering Source

4" High Vacuum Magnetron Sputter Source with Quick Connector - HVMSS-SPC-4LD

4" High Vacuum Magnetron Sputter Source with Quick Connector - HVMSS-SPC-4LD

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Product Name 4" High Vacuum Magnetron Sputter Source with Quick Connector - HVMSS-SPC-4LD
Sale Price Call for Price
Product Code HVMSS4
Quantity 수량증가수량감소
상품 옵션
 

The HVMSS-SPC-4 is a 4" diam. circular magnetron sputtering gun which can accommodate a wide range of sputtering targets, such as metallic/insulating or magnetic/non-magnetic. The circular rare-earth NdFeB permanent magnet is implemented to ensure excellent film uniformity and target utilization. Such a sputtering gun is easy to operate and maintain. Installation is straight forward and it can be operated with either DC or RF power supply.


SPECIFICATIONS:


Features

  •      •  Made of high-quality materials of stainless steel and ceramics.

  •      •  Electromagnetic finite element calculations are used in the design of the permanent magnetic assembly
             to achieve high field strength and uniform field profile.
  •      •  The magnet is coated with protective material against cooling water corrosion to maximize durability.

  •      •  Standard RF connector, which matches with a wide range of DC and RF sputtering power supplies.
  •      •  The low impedance sputtering heads are easily interfaceable with an external power supply.

  •      •  Easy to install a standard fitting with included quick connector

  •      •  Target replacement is easy and  no need to adjust the gun to fit targets with different height.


Power Requirement

  •      •  DC (Max.) 2000 W
  •      •  RF (Max.)  1000 W


Electrical Connection Type




  •      •  Standard HN Female Connector is included (DC and RF, Picture below left )
  •      •  Optional SL16 cable Connector   ( Picture below right)
  •      •  148 cm RF cable is recommended with extra cost (click Pic. right 1 to order)

                        

Sputtering Current (Max.)3 Amp
Sputtering Voltage100-1000 V
Sputtering Pressure3 - 50 mTorr
Operating Temperature 10 - 100oC


Sputtering Uniformity Curve
   
       



Dimensions

  •      •  Total Length: 14"
             



Sputtering Target

  •      •  Diameter:                         4.0"
  •      •  Thickness:                       up to 1/8" for non-magnetic target; up  to 1/16" for magnetic target
  •      •  Utilization:                        up to 30%
  •      •  Magnet:                            NdFeB Rare Earth Magnet


Cooling Water Requirement

  •      •  Flow Rate:                        
    2.0 GPM
  •      •  Water Inlet Temperature:     <20 C
  •      •  Water tubing:                     0.25" O.D.

Mounting
  • Feedthrough:                      3/4" O.D.tube
Net Weight3.5 lbs




Accessories

  •      •  High vacuum Quick connector with 0.75" ID is included. Use this component to install the sputtering
             source onto the baseplate (up to 1” thick) of a vacuum chamber with  1” diameter through-hole at easy
            (click pic below left to see detail )
  •      •  Digital Temperature Controlled Circulating Water Chiller with 6 Liters Tank, 16L / min Flow is available
            at extra cost, please click picture below right to order.


                             


Operation Instructions

             

WarrantyOne year limited with lifetime support