AllN Template on saphhire is made by a Plasma Vapor Deposition of NanoColumns (PVDNC)-based method.
AlN template is a cost effective way to replace AlN single crystal substrate.
Specifications
• Sizes 4” Round
• Dimensions: 100 mm +/- 2mm
• Substrate Sapphire Orientation: c-axis (00.1) +/- 0.3deg.
• Type and Doping: Undoped, Semi-insulating
• Macro Defect Density: <=5 cm-2
• Front Surface Finish (Al Face): As-grown
• Back Surface Finish Sapphire as-received finish
• Useable Surface Area >90%
• Edge Exclusion Area 1mm
• Package Single Wafer Container
• AlN layer thickness 1000 nm , (¡À 10%)
Related data
For Surface Rughness and XRD data, Please click here.