GaAs(100) Si- doped

GaAs , Growing Method: VGF(100)  Si doped, N-type,  2" dia x 0.5mm, 2sp,Carrier Concentration: (3.8-6.2) x 10^16 /cm^3

GaAs , Growing Method: VGF(100) Si doped, N-type, 2" dia x 0.5mm, 2sp,Carrier Concentration: (3.8-6.2) x 10^16 /cm^3

기본 정보
Product Name GaAs , Growing Method: VGF(100) Si doped, N-type, 2" dia x 0.5mm, 2sp,Carrier Concentration: (3.8-6.2) x 10^16 /cm^3
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Product Code GASia50D05C2-VGF-US
Quantity 수량증가수량감소
상품 옵션
 
  •  GaAs single crystal wafer
  • Growing Method
  • VGF
  • Orientation
  • (100)
  • Size
  • 2" dia x 0.5 mm
  • Polishing
  • two sides polished
  • Doping
  • Si doped
  • Conductor type
  • S-C-N
  • Carrier Concentration
  • (3.8 - 6.2) x 1016 /cm3
  • Mobility
  • 3450 - 3890 cm2/V.S
  • Resistivity
  • (2.74 - 4.24) E-2 ohm.cm
  • EPD
  • < 5000 cm2
  • Ra(Average Roughness)
  • < 0.4 nm
  • EPI ready surface and packing