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MgO Substrates(100)
MgO (100) Epi polishing wafer 2" Dia x0.5mm, 2SP
- Specifications of MgO substrate
- Size
- 2" diameter x 0.5mm +/_ 0.05 mm
- Orientation
- (100) +/-0.5 Deg
- Polish
- Two sides EPI polished by CMP technology with minimum sub-surface damage.
- Surface finish (RMS or Ra)
- < 10A
- Packing
- The substrate is packed with 100 grade clean plastic bag under 1000 class clean room.
- Precautions
- MgO is sensitive to moisture, and must be stored in vacuum box.
- Crystal Structure
- Cubic, a=4.216 Å
- Growth Method
- Special Arc Melting
- Typical Impurity (ppm)
-
Ca < 40,
Al < 15,
Si < 10,
Fe < 50,
Cr < 10,
B < ,
C < 10
- Crystal cleavage plane
- <100>
- Thermal expansion
- 12.8 x10-6/ oC
- Optical Transmission
- •> 90% @ 200 ~ 400 nm
•> 98 % 500 ~ 1000 nm
- Crystal Prefection
- No visible inclusions and micro cracking, X-Ray rocking curve available
- Standard MgO Crystal Substrates Specification
- Orientation
- •<100> ±0.2o
•<110> and <111> ±0.5o
- Polished surface
- EPI polished on one side or two sides to Ra < 5 Å
- Special size and orientation are available upon request
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