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GaAs(100) Si- doped
GaAs , Growing Method: VGF(100) Si doped, N-type, 3" dia x 0.625mm, 2sp,Carrier Concentration: (1.4-3.96) x 10^18 /cm^3
- GaAs single crystal wafer
- Polishing
- two sides polished
- Carrier Concentration
- (1.4 - 3.96) x 1018/cm3
- Mobility
- 1420 - 2090 cm2/V.S
- Resistivity
- (1.1 - 2.14) E-3 ohm.cm
- Ra(Average Roughness)
- < 0.4 nm
- EPI ready surface and packing
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Working days : Monday to Saturday
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