• M <10-10> ori. sapphire wafer is being used extensively as a substrate for III-V nitrides and magnetic epitaxial films due to its better lattice mismatch
• Wafer size: 2" dia x 0.5 mm thickness
• Orientaion: M plane <10-10>orn +/-0.5 Deg
• Polished surface: Wafer surface is EPI polished via a special CMP procedure. Price listed here is for one side polished
• Package: Each wafer is packed in 1000 class clean room with 100 grade plastic bag with wafer container