Au/Cr coated SiO2/Si substrate

Au (highly oriented polycrystalline) /Cr coated SiO2/Si substrate ,4"x0.525 mm,1sp P-type B-doped, Au(111)=50 nm, Cr=5 nm

Au (highly oriented polycrystalline) /Cr coated SiO2/Si substrate ,4"x0.525 mm,1sp P-type B-doped, Au(111)=50 nm, Cr=5 nm

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Product Name Au (highly oriented polycrystalline) /Cr coated SiO2/Si substrate ,4"x0.525 mm,1sp P-type B-doped, Au(111)=50 nm, Cr=5 nm
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Product Code FmAu50Cr5SO300onSiBa101D05C1
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Silicon Wafer Specifications:

  •      •  Film: Au/Cr coated SiO2/Si substrate ,4"x0.525 mm,1sp  P-type B-doped,
    •          º  Au(111)=50 nm th with grain size: ~ 50 nm at Room Temperature
    •          º  Cr=5 nm
    •          º  SiO2=300 nm
    •          º  Si(100) P type B doped ~525 um Prime Grade

  •      •  Resistivity:  <0.005 ohm.cm 

  •      •  Substrate Size:  4" diameter +/- 0.5 mm x 0.5 mm

  •      •  Polish: one side polished

  •      •  Surface roughness: < 10 A RMS

  •      •  Maximum Thermal Budget of Au film: N/A