VBF-1200X-MPECVD is a affordable and compact MPE-CVD ( Microwave Plasma Enhanced Chemical Vapor Deposition ) ， which is designed for growing daimond thin film or new generation thin film , such as BN, carbon and graphese by liquid - vapor deposition. Microwave source is insearted into 3" vacuum sealed verticle quartz tub e directly to achieve stable microwave plasma and 2" substrate heater is installed on bottom tube with adjustable temperature from 20 °C to 600 °C. Vacuum pump and gas delivery system are available upon customer request
Specifications
Microwave Power Source
•Output Power : 100 - 1000 W adjustable •RF frequency : 2495 MHz •Cooling : Air cooling. •Power : 208 - 240 VAC, 50/60 Hz
Quartz tube
80 mm OD x 76 mm ID x 500 mm L
Substrate Heater
•2" substrate heater is installed on botton flage, which moveable via DC moter to make sample loading at easy. •Max. working temperature is 700 oC with +/ 1 oC accuracy •Precision digital temperature controller is included and built in bottom table, which is 30 segement programable with PID auto-tune function. •Power requiment : 1200 W, 208 - 240 VAC, single phase (50/60 Hz)
Vacuum Flange and Fittings
•Vacuum flange set is made of stainless steel 304. •An anti-corrosive, gas-type independent digital pirani capacitance diaphragm guage is intalled in left flange. Click the pic below to view detail spec. •Please check the following pics to view detail information
One year limited warranty with lift time support (Consumable parts such as processing tubes, o-rings and heating elements are not covered by the warranty, please order the replacement at related products below.)
Compliance
•CE Certified •Temperature controller is MET and CE Certified
Operation Instruction
Warning
•The tube furnaces with quartz tube are designed for using under vacuum and low pressure < 0.12 MPa (absolute pressure) •MTI reserves right to modify PECVD design at any time without notice, but promise that quality will meet the specifications above
