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  3. Plasma Sputtering Coaters & Plasma...
 
 
Compact Plasma Cleaner with Digital Vacuum Gauge , 3"Dx 6.5"L Quartz Chamber, 13.56 Mhz - EQ-PDC-36GEQ-PDC-36GEQ-PDC-36G-2F

Compact Plasma Cleaner with Digital Vacuum Gauge , 3"Dx 6.5"L Quartz Chamber, 13.56 Mhz - EQ-PDC-36G
EQ-PDC-36G
EQ-PDC-36G-2F

기본 정보
Product Name Compact Plasma Cleaner with Digital Vacuum Gauge , 3"Dx 6.5"L Quartz Chamber, 13.56 Mhz - EQ-PDC-36G
EQ-PDC-36G
EQ-PDC-36G-2F
Sale Price Call for Price
Quantity 수량증가수량감소
상품 옵션
 
  •  Product Options
Select Model Item Number
Standard Version without Gas Mixer EQ-PDC-36G
Updated Version w/ Gas Mixer EQ-PDC-36G-2F
  • EQ-PDC-36G is a 3" compact plasma cleaner with digital vacuum sensor and display, and as well as hinged door.    which is designed to clean and remove nanoscale organic contamination on wafer upto 2" with various gas easily. .    The rate of organic removal is about 10 nm/min Max. at high RF power.    It is an excellent tool to pre-clean single crystal substrate before coating to the acheive a better film quality.    If you don't have any experience for plasma surface cleaning, please refer to the articles as the follows :

  • ○  McIntire, Theresa M., S. Rachelle Smalley, John T. Newberg, A. Scott Lea, John C. Hemminger, Barbara J. Finlayson-Pitts. "Substrate Changes Associated with the Chemistry of Self-Assembled Monolayers on Silicon." Langmuir (2006) 22(13): 5617-5624.
    ○  Sumner, Ann Louise, Erik J. Menke, Yael Dubowski, John T. Newberg, Reginald M. Penner, John C. Hemminger, Lisa M. Wingen, Theo Brauers, Barbara J. Finlayson-Pitts. "The Nature of Water on Surfaces of Laboratory Systems and Implications for Heterogeneous Chemistry in the Troposphere." Phys. Chem. Chem. Phys. (2004) 6: 604-613.
    ○  Mennicke, Ulrike, Tim Salditt. "Preparation of Solid-Supported Lipid Bilayers by Spin-Coating." Langmuir (2002) 18: 8172-8177.

  •  SPECIFICATIONS
  • Input Power
  • •AC 220 V,   50/60 Hz,   single phase
    •For operation under AC110V, we provide additional (1500W transformer) 
  • RF Power
  • RF power (High voltage & high frequency current applied on the coil) is adjustable at three levels :
    Low Setting 680 V 10 mA 7 W
    Medium Setting 700 V 15 mA 11 W
    High Setting 720 V 25 mA 18 W
  • Plasma Chamber
  • •3" diameter x 6.5" length made of high purity quartz chamber
    •longer service life than glass
    •Hinged type door for easy sample loading.
  • Vacuum Gauge & Display
  • •A vacuum sensor is installed on the hinged door,w ch allow processing is repeatable without guessing
    •digital display unit is included for measuruing vacuum in Pa,torr and mbar units.
    •1/8" NPT needle valve to qualitatively control gas flow and chamber pressure.
    •1/8" NPT 3-way valve to quickly switch from bleeding in gas, isolating the chamber, and venting.
  • Vacuum Pump
  • One Single Step Rotary Vane Vacuum Pump with filter and vacuum tube are included.
  • Working Gases
  • •Many inert gases can be choosen for plasma cleaning, such as N2, Ar, Air and Mixed gas depended on what kind material will be treated. ( Please select two channel gas mixer from model selection ) 
    •< 5% H2 mixed iner gas can be used
    •No flammable gas shall be used for the plasma cleaner.
  • Overall dimension
  • Net Weight
  • 40 Lbs
  • Optional Accessories
  • •Combinations of PDC-36G plasma cleaner with Two Channel Gas Mixer will be a solution for introducing upto two (2) process gases.    Order plasma cleaner with two channel gas mixer from product options or Click the picture below for Two Channel Gas Mixer.
    •You may order quartz wafer carrier to clean 2" wafer
     
  • Warranty
  • One year limited warranty with lifetime support
    ( no warranty for Pyrex glass chamber )
  • Operation Instructions
  •  Related Products
 
  

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