MTI KOREA Battery
Battery R & D
- Coin Cell Preparation
- Cylindrical and Prismatic Cell Preparation
- Pouch Cell Preparation
- Battery Test Equipment
- Consumables for Battery R&D Synthesis
- Thermoelectric Materials
- Zinc-Ion Batteries
Crystal & Material
Crystals Substrates : A-Z
Ceramic Substrates : A-Z
Thin Film on Substrates : A-Z
Metallic substrate :A to Z
Nano Powder&Chemical
Target / Evaporation : A-Z
Thermal Processing
Smart Furnaces
- Muffle Furnaces (400-1800°C)
- Tube Furnaces (1- 7 Zones)
- CVD Furnace System
- Hi-Pressure & H2 Gas Furnaces & Hot Pressing
- RTP Furnaces
- Crystal Growth System
- Dry Ovens / Hot Plates
- Melting and Casting
Furnace Accessories
Plasma System
Plasma Sputtering & Cleaning
PECVD
Microspheres-Nanospheres
Inorganic
Organic
Magnetic
Radioactive
Size Standards
Sample Preparation & Analysis
Cutting / Dicing Saws
Polishing Machines
Lab Press & Rollers
Power & Slurry Mill / Mixer
Film Coating
Desktop Machine-shop
Material Analysis
TGA Analysis
Battery / Capacitor Analyzers
Desk-Top X-Ray Instruments
Digital Microscopes
Other Lab Equipment
Glove Box & Fume Hood
Digital Lab Balances
Plasma/UV-Zone Cleaners
Ultrasonics/Water Circulator
UV Equipment & Adhesives
Lab Ware / Accessory
Sample Handling
Gel Sticky Boxes
Membrane Film Boxes
Round Wafer Carriers
IC Tray & Plastic Boxes
Vacuum Pen & Tweezers
Knowledge Center
등록 제품 : 12개
-조건선택- -조건선택-
상품명 : 1700°C Max. Dual Zone Alumina Tube Furnace with Optional Alumina Tube from 50 - 80mm OD - GSL-1700X-II
상품명 : 1500°C Two Zone Split Tube Furnace with Flange & Mullite Tube (82 mm) - OTF-1500X-II
상품명 : 1100ºC Dual Zone Tube Furnace w/ 11" Quartz Tube & Vacuum Flanges ( 24" heating zone) - GSL-1100X-II-11
상품명 : 1500°C Max. Dual Zone Tube Furnace with Optional 2" 3" or 4" Mullite Tube GSL-1500X-II
상품명 : 1200°C Dual Zone Split Tube Furnace with Optional Quartz Tube(60, 80, 100mm) & Vacuum Flanges - OTF-1200X-II
상품명 : Dual Heating Zone 1200C Compact Split Tube Furnace with Optional 1"- 2" Tube & Flange - OTF-1200X-S-II
상품명 : 1200C Dual Zone Split Tube Furnace with Revolving Sample Feeding System upto 4 Crucibles For HPCVD - OTF-1200X-II-ZL
상품명 : 1200C Dual Zone HPCVD Furnace with Sequential & Co-Deposition Source Feeding System (upto 4 Crucibles)- OTF-1200X-II-HPCVD-SE
상품명 : Two Heating Zones ( 1100°C) Split Vertical Tube Furnace with 4" Quartz Tube & Vacuum Flanges for CVD & CSS - OTF-1200X-VT-II-100
상품명 : Three Heating Zones Max. 1200°C Split Vertical Tube Furnace with 2" Quartz Tube & Vacuum Flanges for CVD & CSS - OTF-1200X-VT-III-50
상품명 : Two Zones CSS Furnace for Rapid Thermal Processing Upto 3" Dia. & 650ºC. - OTF-1200X-RTP-II
상품명 : Two Zones CSS Furnace for Rapid Thermal Processing upto 5" Dia Wafer at Max.800°C - OTF-1200X-RTP-II-5