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Ge Substrate (111) 10x5x 0.5 mm, 2 SP, Sb-doped . 0.2-0.26 Ohm.cm
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GaSb Wafer (100), undoped, 3"x0.625 mm One side polished
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GaP Wafer, undoped (110) 5x5x0.3 mm, 2sp
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GaP Wafer undoped (100) 2"x0.5 , two sides optical polished (60/40)
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GaN Epitaxial Template on Sapphire (C plane), N type, undoped, 2" x 30 micron
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Si-doped GaN (0001) Epitaxial Template on Sapphire N-type, 2"x 4.5 micron,1sp
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Mg-doped P-type GaN (0001) Epitaxial Template on Sapphire 2"x 2 micron,1sp
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GaAs( LEC ) Wafer (100) undoped Semi-Insulated 2"D x0.5 mm, 2SP
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GaAs , Growing Method: VGF(100) Si doped, N-type, 2" dia x 0.5mm, 2sp,Carrier Concentration: (1.0-1.1) x 10^18 /cm^3
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Bench-Top Precision Automatic Hot Calender (11" W x 8.5" Dia. up to 55C) - MSK-HRP-02-LD
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One 55 mm x 55 mm (2.17"x2.17") Gel Sticky Box with Tray- Transparent Cover - (SP2-5510T/BK-LL-P33)
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Super 1800 MoSi2 Heating Element (40x300mm)
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Super 1800 MoSi2 Heating Element (30x420mm)
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Super 1800 MoSi2 Heating Element (30x360mm)
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Super 1800 MoSi2 Heating Element (30x300mm)
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Super 1800 MoSi2 Heating Element (30x330mm)
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Super 1800 MoSi2 Heating Element (30x270mm)
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PECVD Split Tube Furnace (2''-3.14'' OD) with 4 Channels Gas Delivery & Vacuum System (Max.1200C 10E-3 torr) - OTF-1200X-50-4CLV-PE
OTF-1200X-50-4CLV-PE OTF-1200X-80-4CLV-PE
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1500°C Split Tube Furnace with Vacuum Flanges & available for 2", 3" or 4" Mullite Tube - GSL-1500X-OTF
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Large Muffle Furnace (16x16x16", 64 L,1100°C max ) with 30 Segments Digital Temperature Controller - KSL-1100X-L
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1200°C Box Furnace (12x8x5", 7.2 liter) with 30 Segments Digital Controller and Vent Port / Window (208-240VAC) - KSL-1100X
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Thermal Oxide Wafer: 300 nm SiO2 Layer on Si (100), 3"dia x 0.50 mm t, P-type ,B-doped 1SP R:1-10 ohm.cm
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Thermal Oxide Wafer: 100 nm SiO2 Layer on Si (100), 4"dia x 0.50 mm t, P-type ,B-doped 1SP R:< 0.005 ohm.cm
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Thermal Oxide Wafer: 300 nm SiO2 Layer on Si (100), 4"dia x 0.525 mm t, P-type ,B-doped 1SP R:0.001- 0.002 ohm.cm
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SOI Epitaxial Wafer: 4" , 20um (P/Boron) + 2 um SiO2 + 500um Si ( undoped )
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Ta Metallic Substrate: 10x10x0.5 mm, 1side polished
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FTO Glass Substrate (TEC 70) 100x100 x 3.2 mm, R:58-72 ohm/sq 25pcs /pack
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CdWO4 Random orientation 5 Dia. x0.4mm, 1 side polished
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2.0 gallon Air Scout Compressor - EQ-HD1004TK
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1.5 gallon Air Scout Compressor - EQ-HAC-110
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CdSe single crystal substrate ,Cd-doped ( 0001) 10x10x1.0mm,2sp Low Resistivity
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CaF2, (111), 1"x1.0 mm , 2 Side polished
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CaF2, (110), 1"x1.0 mm , 2 Side polished-
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BaTiO3 (110) 10 x 10 x1.0 mm, 2SP, Substrate grade
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Al2O3- Sapphire Wafer, R Plane, 3" dia x 0.5mm, 2SP
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Single Zone Tube Furnace with 8.5" Quartz tube and Hinged Type Vacuum Flanges (1100 ºC , 24" heating zone) - EQ-GSL-1100X-8.5-S-UL
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Aluminum Single Crystal Substrate: <100>, 8 mm Dia. x3.0 mm, 1 side polished
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300ºC Max. 90mm O.D Tube Furnace with Vacuum Sealed Flanges & Water/Gas Cold Wall for Sample Annealing in High Magnetic Field - GSL-1200X-MH4
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coin cell flow chart
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Working days : Monday to Saturday
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